SBIR Phase II: Novel Technologies to Enable High Volume, Extreme Ultraviolet Manufacturing of Integrated Circuits
The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase II project are to accelerate the arrival of next generation computing technology creating faster, smaller more powerful mobile devices, renewing the expected technological pace of development set by Moore's law, and to enable global access to next generation electronics. The technology developed here will enable new extreme ultraviolet lithography in semiconductor manufacturing. The developments will promote learning, understanding and capability in commercialization and scalability of nanotechnology engineering. This Small Business Innovation Research (SBIR) Phase II project aims to evaluate the feasibility of new extreme ultraviolet (EUV) technologies which enable high volume manufacture of Integrated Circuits at 14nm and smaller. Currently capital equipment manufacturers are facing significant challenges in meeting the International Technology Roadmap for Semiconductors requirements for high volume manufacturing of integrated circuit chips. This has caused severe ramifications to chipmakers on the success of next generation IC manufacturing and fabrication facility costs. Successful results from the work proposed would represent notable progress in high volume manufacturing using EUV capital equipment. The intellectual merit of this proposed work forms the basis of new state of the art industry architecture designed for volume manufacturing; a pursuit that would subsequently encourage new markets and applications using next generation technology overcoming cost challenges in high volume manufacturing processes. less The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase II project are to accelerate the arrival of next generation computing technology creating faster, smaller more powerful mobile devices, renewing the expected technological pace of development set by Moore's law, and to enable global access to next generation electronics. The technology developed here will enable new extreme ultraviolet lithography in semiconductor manufacturing. The developments will promote learning, understan... more
We seek an outstanding research/industry oriented fellow who desires an exciting opportunity working in the semiconductor industry developing new nanoscale devices at 14 nm and smaller. Astrileux is a rapidly growing semiconductor R&D company in Berkeley, California that has an immediate opening for a Postdoctoral Research Fellow. The successful applicant will develop and commercialize new nanoscale devices, integrating them in the next three generations of technology. Initial responsibilities for this position will require extensive work in several nano fabrication and nano-characterization facilities located in California. Travel to conferences, customer facilities to give presentations will be occasionally required. Some typical start-up company job activities may also be additionally required. This project is supported by National Science Foundation through a small business innovation grant. We hope to provide the fellow with an exciting opportunity to be part of an early stage development project with great market impact, and a chance to see their work implemented at forefront of science, through leading edge technology in a next-generation industry.
We search for an outstanding research/industry oriented fellow who seeks an exciting opportunity working in the semiconductor industry developing new nanoscale devices at 14 nm and smaller.
Education: Candidate should have a PhD in either Materials Science, Engineering, Chemistry, Physics, Optics, Experimental Biology, Chemical Engineering, or similar experience. All experience levels are welcome to apply.
Desired Experience: - Experience working in a Class 10 clean room, with use of nano fabrication equipment including deposition, lithography and characterization systems. - Experience synthesizing, characterizing, sub-20 nm systems, and using AFM, SEM, XPS, XRD, TEM, SAXS, XRF, tools -Experience in synthesis of new materials is desired.
Required Skills: - Great communication and writing skills. - Ability to multi-task in a wide variety of technical disciplines. - Must be willing to perform tasks outside of general job description. - Must be self-motivated and able to perform with little supervision. - Must work well in a fast paced, start-up environment. - Good data analytical skills, including presentation and software skills.
Work Eligibility: - US Citizen or a Permanent Resident preferred.
